The Deposition Condition of Diamond on a Fine Wire by Hot Filament CVD
نویسندگان
چکیده
منابع مشابه
High-rate deposition of amorphous silicon films using hot-wire CVD with a coil-shaped filament
To reduce the manufacturing cost of amorphous silicon (a-Si:H)-based photovoltaic devices, it is important to deposit highquality a-Si:H and related materials at a high deposition rate. To this end, we designed and constructed a hot-wire deposition chamber with a coiled filament design and with multiple gas inlets. The process gas could be directed into the chamber through the filament coil and...
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Microcrystalline silicon (mc-Si:H) and amorphous silicon (a-Si:H) films were deposited using a hot-wire CVD (HWCVD) system that employs a coiled filament. Process gasses, H and Si H , could be directed into the deposition chamber via different 2 2 6 gas inlets, either through a coiled filament for efficient dissociation or into the chamber away from the filament, but near the substrates. We fou...
متن کاملComputer Simulation of Temperature Parameter for Diamond Formation by Using Hot-Filament Chemical Vapor Deposition
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ژورنال
عنوان ژورنال: Journal of The Surface Finishing Society of Japan
سال: 2010
ISSN: 0915-1869
DOI: 10.4139/sfj.61.441